Electrodeposition of p-type, n-type and p-n Homojunction Cuprous Oxide Thin films

Abstract

Potentiostatic electrodeposition of cuprous oxide (Cu2O) thin films in aqueous acetate baths was investigated to study the conduction type, n-type or p-type, and the p-n homojunction formation of the films, using photocurrent spectral response and capacitance-voltage measurements to determine the conduction type. The study reveals that not only the pH value but also the cupric ion concentration of the acetate bath determines the conduction type of the films. Electrodeposition of p-n homojunction of Cu2O is possible with a single or a two step electrodeposition. Both parameters of the deposition bath, pH and cupric ion concentration, can be adjusted to control conduction type and p-n homojunction formation of Cu2O films.